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Photomasks

Photomasks explained

  • A photomask is a PET or glass substrate that serves as a base plate for patterning used in the manufacture of electronic components (semiconductors), printed circuit boards, MEMS, and other products.
  • It serves as a base plate for transferring electronic components and circuit patterns on printed circuit boards using a transfer technology called photolithography.
  • Photomasks are used in a wide range of fields, including printed circuit boards such as PWBs and FPCs, IC packaging, display devices such as LCDs and touch panels, and semiconductor-related electronic components.
Photomask

Features of photomask manufacturing

02

Quality assurance of high precision photomask products

We use the FPD total pitch measurement system for total pitch measurement and inspection of photomask products. We provide quality improvement, quality assurance, and stable quality products around high precision photomasks.

High-precision measuring equipment
Inspection using a nigh-precision measuring instrument
02

A production system that enables quick delivery

For chrome mask production, we offer a 24-hour manufacturing system that enables us to deliver in the shortest possible time.

Film masks

A basic mask with excellent cost performance. In addition, its polyester base makes it lightweight and flexible for easy handling.

Main applications

Used for PWB, FPC, electronic components, graphics, etc.

Features

  • This is the most cost-effective type of photomask.
  • Since it is polyester based, it is lightweight, flexible, and easy to work with.
  • We can provide detailed support early on from the data editing stage.
  • We support fine patterns of about 30 µm.

Supported data

Gerber(274D/274X) / DWG / DXF / GDS2 /ODB++
※We also offer methods of sending and receiving data confidentially,so please contact us.

Optional

Supports laminate film attachment

Standards and specifications

Substrate Polyester
Supported sizes ~711x813mm
Material thickness 175μm
Film quality Silver salt gelatin emulsion
Film thickness 7~8μm
Minimum lines 30μm
Short dimension accuracy ±3.0μm~
Long dimension accuracy ±20.0μm~

*Please contact us for sizes other than those listed above.

Film masks

Emulsion glass masks

We use high-resolution emulsions for our photomasks, and being glass-based, they feature higher dimensional stability than film masks.

Main applications

FPD (LCD/OLED), electronic components, packaging, etc.

Features

  • Glass-based masks have higher dimensional stability than film masks.
  • Fine silver particles have less fringing and excellent resolving power.
  • We can provide detailed support early on from the data editing stage.
  • A high-resolution emulsion supporting fine patterns of about 20μm.
    ※Patterns of under 20μm may be possible depending on conditions. Please do not hesitate to contact us.

Supported data

Gerber(274D/274X) / DWG / DXF / GDS2/ODB++
※We also offer methods of sending and receiving data confidentially,so please contact us.

Optional

Compatible with hard coatings

Standards and specifications

Substrate Soda lime
Supported sizes ~711x813mm
Material thickness 1.8mm~5.0mm
Film quality Silver salt gelatin emulsion
Film thickness 5~6μm
Minimum lines 10μm~
Short dimension accuracy ±1.0μm~
Long dimension accuracy ±3.0μm~

*Please contact us for sizes other than those listed above.

Emulsion glass masks

Chrome glass masks

High-spec glass masks that meet all requirements for high definition and high precision Using synthetic quartz material allows for stabilizing the dimensions against temperature changes during exposure. A high-definition mask that can handle up to a minimum pattern width of 2μm.

Main applications

MEMS, LCD, OLED, WLP, thin film chip components, etc.

Features

  • Suitable for ultra-high definition imaging due to the lack of fringing.
  • Using synthetic quartz material allows for stabilizing the dimensions against temperature changes during exposure.
  • Excellent transfer performance due to thin light-shielding film thickness
  • Available up to 2μm minimum pattern width

Supported data

Gerber(274D/274X) / DWG / DXF / GDS2/ODB++
※We also offer methods of sending and receiving data confidentially,so please contact us.

Optional

Compatible with thin-film water and oil repellent coatings and hard coatings

Standards and specifications

Substrate Soda lime/synthetic quartz
Supported sizes ~700x800mm
Material thickness 1.0mm~5.0mm
Film quality Low reflection 2-layer chrome/
single layer chrome/3-layer chrome
Film thickness 100~125nm
Minimum lines 2μm~
Short dimension accuracy ±0.2μm~
Long dimension accuracy ±0.5μm~

*Please contact us for sizes other than those listed above.

Chrome masks

Substrate comparison table

Substrate/manufacturing standard

Film masks Emulsion glass masks Chrome glass masks
Substrate standard Substrate Polyester Soda lime Soda lime/synthetic quartz
Substrate thickness 175μm 1.8~5.0mm 1.0~5.0mm
Film quality Silver salt gelatin emulsion Silver salt gelatin emulsion Low reflection 2-layer chrome/single-layer chrome/3-layer chrome
Film thickness 7~8μm 5~6μm 100~125nm
Supported sizes ~711×813mm ~711×813mm ~700×800mm
Rendering area ~690×800mm ~680×780mm ~700×800mm
Manufacturing standards Minimum lines 30μm 10μm 2μm
Short dimension accuracy ±3μm~ ±1μm~ ±0.2μm~
Long dimension accuracy ±20μm~ ±3μm~ ±0.5μm~

Image quality comparison (30µm)

Film masks Emulsion glass masks Chrome glass masks
Image Film masks Emulsion glass masks Chrome glass masks

Elasticity of each substrate

Polyester Soda lime Synthetic quartz
Temperature Elasticity 0.001% 0.00085% 0.00006%
1 meter equivalent 10.0μm/℃ 8.5μm/℃ 0.6μm/℃
Wetness Elasticity 0.0015% No No
1 meter equivalent 15.0μm/% No No

We can manufacture various types of masks starting from a single sheet.

Are you looking to have a single prototype piece made? We are equipped to flexibly accommodate small lot orders and other requests. Please do not hesitate to contact us.

Inquiries